Chemical process design and simulation Aspen Plus and Aspen HYSYS applications

Bibliographic Details
Authors and Corporations: Haydary, Juma (Author), American Institute of Chemical Engineers (Editor)
Type of Resource: Book
Language:English
published:
Hoboken, N.J.: AIChE, Wiley, 2019
Subjects:
Chemical engineering
Chemical engineering > Computer simulation
Chemical processes
Chemical processes > Computer simulation
Chemische Verfahrenstechnik > Prozessentwicklung > ASPEN
Source:Verbunddaten SWB
Subject: DK 66
DK 681.3.06
Call number:19.1442 4.
ISBN:9781119089117
9781119311478
1119089115
1119311470

Further editions

Erscheint auch als: Haydary, Juma, Chemical process design and simulation, Hoboken, NJ : AIChE, Wiley, 2019, 1 Online-Ressource (xliv, 391 Seiten), 9781119311478

Zw 7/3

Holdings details from Zw 7/3
19.1442/14. Unavailable  – Due: 17.02.2020  Recall this
Notes:
  • Vormerkung möglich
Shelf location: Zw 7/3 ⋅ 32.170

Hauptbibliothek

Holdings details from Main library
19.1442/24. Available Shelf location: Main library ⋅ Fachbuchfreihand (FBF) ⋅ 66... Hay Shelf location
19.1442/34. Unavailable  – Due: 26.03.2020  Recall this
Notes:
  • Vormerkung möglich
Shelf location: Main library ⋅ Fachbuchfreihand (FBF) ⋅ 66... Hay