Regrowth rates and dopant activation of Sb+‐implanted Si‐Ge alloys

Bibliographic Details
Journal Title: Journal of Applied Physics
Authors and Corporations: Hong, Stella Q., Hong, Q. Z., Mayer, James W.
In: Journal of Applied Physics, 72, 1992, 8, p. 3821-3823
Type of Resource: E-Article
Language:Undetermined
published:
AIP Publishing
Subjects: